EQUIPMENT

Growth and Fabrication

The ample portfolio of chemical and physical growth and fabrication methods available make it posible to have access to a wide variety of materials and metastructures of interest. We are experts on materials fabrication through electrochemical processes and high vacuum techniques. Also, we have access to UV and electron lithography facilities, and FIB (MINA).

Electrochemical deposition

The electrodeposition is an electrochemical process where a reduction of the ions, which are present in a solution (known as electrolyte), are reduced onto a conductive substrate.

Porous alumina template fabrication

The anodic aluminum oxide (AAO) membranes are alumina membranes grown by an electrochemical method, known as anodization, which induces the formation of aluminum oxide on an aluminum surface and under certain conditions pores that self-ordered.

Sputtering

This lab-made sputtering system reaches a base vacuum of 10-9 mbar and ultrapure argon (99.9999%) is used as the sputtering atmosphere. Features: RF and DC power supplies and High-power impulse Magnetron sputtering – HiPIMS.

Thermal treatments

The MILA-5000 series can perform high speed heating and cooling. This oven is based on a near-infrared lamp for a precise temperature control.

Ultra-high-vacuum deposition systems

Two deposition systems with a base pressure in the 10^-10 mbar for the physical deposition by MBE and sputtering of a wide variety of materials.

More Information

3D printer

3D Prusa i3 Hephestos printer

Morphological characterization

AFM

Spectroscopies

RAMAN

INFRARED SPECTROSCOPY

Electrical Characterization

HALL MEASUREMENTS

THERMOELECTRIC POWER FACTOR MEASUREMENT

Thermal Characterization

THERMAL CONDUCTIVITY

Magnetic Chatacterization

FTIR SPECTROMETER WITH IR MICROSCOPE AND ATR OBJECTIVE

PHOTOCURRENT/PHOTOVOLTAGE MEASUREMENTS

TRANSVERSE LONGITUDINAL KERR

Others

DENSITY MEASUREMENT